Codex International proposes a thermal oxidation service for Si wafers by dry or wet process allowing the growth of a dense and uniform oxide layer of high dielectric strength and thickness from a few nanometers to 50 microns.
Nitriding
Our LPCVD wafer Si3N4 Nitruration service allows, among other things, to obtain high chemical resistance to acids, salts [...]
Compliance certificates
All our materials are analyzed before delivery by Inductively Coupled Plasma spectrometry and are accompanied by their c [...]
On request deposition
Codex International offers its customers the ability to metallize their Si wafers (single or multilayers). A range of me [...]
