[Thin-Film Innovation] - EPC© sputtering targets manufacturing process

Product innovation
Codex International’s new EPC © (Enhanced Process Control) process is an innovative manufacturing process that improves target performance, durability and deposit homogeneity.
Codex International has developed a new technology for manufacturing EPC© sputtering targets that optimizes the flow of materials and significantly improves their sputtering performance.
Our EPC© process allows a better control of crystalline orientations and grain size (especially for ferromagnetic materials). Sputtering targets manufactured using Codex International’s EPC© process have the following competitive advantages
– Minimize magnetic shunting
– Stabilize the plasma
– Improve thin film uniformity
– Increase thin film deposition rates and reduce cycle times.

Discover Also

[Thin-Film Innovation] – EPC© sputtering targets manufacturing process 22 June 2021

Le nouveau procédé EPC © (Enhanced Process Control) de Codex International est une procédé de fabrication innovant qui améliore les performances et la durabilité des cibles ainsi que l’homogénéité des dépôts.

[Thin Films] – How is CVD Used to Create Thin Films for Semiconductors? 1 November 2020

CVD is a well-known technique in the nanofabrication space known for being able to take a vaporized reactant and deposit it onto a surface to form a thin film. There are many thin films and nanomaterials which can be fabricated using CVD, with the most notable being graphene.